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Volumn 16, Issue 5, 2000, Pages 324-329

The effect of phosphoric acid concentration on resin tag length and bond strength of a photo-cured resin to acid-etched enamel

Author keywords

Enamel bonding; Etching; Hybridized enamel; Monomer impregnation; Orthodontics; Phosphoric acid; Photocured resin; Scanning electron micrograph; Sealant; Tag

Indexed keywords

2 HYDROXY 3 BETA NAPHTHOXYPROPYL METHACRYLATE; 2-HYDROXY-3-BETA-NAPHTHOXYPROPYL METHACRYLATE; MACROGOL DERIVATIVE; METHACRYLIC ACID DERIVATIVE; PHOSPHORIC ACID; POLYMETHACRYLIC ACID DERIVATIVE; RESIN CEMENT; TRIETHYLENE GLYCOL DIMETHACRYLATE;

EID: 0034278167     PISSN: 01095641     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0109-5641(00)00024-5     Document Type: Article
Times cited : (95)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.