Ion time-of-flight analysis of ultrashort pulsed laser-induced processing of Al2O3

Applied Surface Science

Volumn 165, Issue 1, 2000, Pages 44-55

  Stoian, R ^a   Varel, H ^a   Rosenfeld, A ^a   Ashkenasi, D ^b   Kelly, R ^b   Campbell, E E B ^c  

^a MAX BORN INSTITUT   (Germany)

^b UNIVERSITY OF TRENTO   (Italy)

^c CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; LASER ABLATION; LASER PULSES; MORPHOLOGY; SPUTTERING; SURFACE STRUCTURE;

COULOMB EXPLOSION; ION TIME-OF-FLIGHT ANALYSIS;

ALUMINA;

EID: 0034275942     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00361-5     Document Type: Article

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