Effects of chemical etching with hydrochloric acid on a glass surface

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 5, 2000, Pages 2563-2567

  Jang, H K ^a   Chung, Y D ^a   Whangbo, S W ^a   Lyo, I W ^a   Whang, C N ^a   Lee, S J ^b   Lee, Seok ^c  

^a Yonsei University   (South Korea)

^b Advanced Lab Solution   (South Korea)

^c Korea Institute of Science and Technology   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ATOMIC FORCE MICROSCOPY; CALCIUM; ETCHING; HYDROCHLORIC ACID; REDUCTION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SODIUM; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL ETCHING; GLASS SLIDES;

GLASS;

EID: 0034275685     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1287445     Document Type: Article

References (14)

1. H. K. Pulker, Coating on Glass (Elsevier, Amsterdam, 1984).
2. H. Rawson, Properties and Applications of Glass (Elsevier, Amsterdam, 1980).
3. I. Blech, H. Sello, and L. V. Gregor, in Thin Films in Integrated Circuits, edited by L. I. Maissel and R. Glang (McGraw-Hill, New York, 1970), pp. 23 and 22.
4. I. Keesmann and Z. A. Allgem, Chem. 346, 30 (1966).
5. H. Bach and H. Schroeder, Thin Solid Films 1, 255 (1967/68).
6. A. Cousen, J. Soc. Glass Technol. 20, 418 (1936).
7. E. L. Mochel, M. N. Nordberg, and T. E. Elmer, J. Am. Ceram. Soc. 49, 585 (1966).
8. Y. Paz and Z. Luo, J. Mater. Res. 10, 2842 (1995).
9. Y. Paz and A. Heller, J. Mater. Res. 12, 2759 (1997).
10. H. K. Jang, Y. D. Chung, W. Whangbo, Y. S. Lee, I. W. Lyo, and C. N. Whang, J. Vac. Sci. Technol. A 18, 401 (2000).
11. L. R. Doolittle, Nucl. Instrum. Methods Phys. Res. B 15, 227 (1987).
12. J. F. Moulder, W. F. Stickle, P. E. Sobol, and K. D. Bomben, Handbook of X-Ray Photoelectron Spectroscopy (Perkin-Elmer, Minnesota, 1992).
13. S. M. Budd and J. J. Kirwan, in Advances in Glass Technology (Plenum, New York, 1962), Vol. 1, pp. 527-540.
14. F. Abulfotuh and L. L. Kazmerski, in Thin Film Technology Handbook, edited by A. A. R. Elshabini-Riad and F. D. Barlow III (McGraw-Hill, New York, 1997), pp. 6-48.