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Volumn 18, Issue 5, 2000, Pages 2239-2243

Er deposition in the submonolayer range on weakly boron-doped Si(111) surface

Author keywords

[No Author keywords available]

Indexed keywords

DOPING (ADDITIVES); EPITAXIAL GROWTH; ERBIUM COMPOUNDS; INTERFACES (MATERIALS); NUCLEATION; SCANNING TUNNELING MICROSCOPY; STRAIN;

ERBIUM SILICIDE; REACTIVITY;

BORON;

EID: 0034275293 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1285934 Document Type: Article

Times cited : (3)

References (9)

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