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Applied Physics A: Materials Science and Processing

Volumn 71, Issue 3, 2000, Pages 285-297

Computer simulation of pulsed laser processing of amorphous Si

(1) Tosto, S a

a ENEA C R CASACCIA (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; LIGHT ABSORPTION; MATHEMATICAL MODELS; MELTING; NUCLEATION; NUMERICAL METHODS; OPTICAL PROPERTIES; PULSED LASER APPLICATIONS; THERMAL EFFECTS; THERMODYNAMIC PROPERTIES;

HEAT EQUATIONS; NUCLEATION RATE; PULSED LASER IRRADIATION;

AMORPHOUS SILICON;

EID: 0034273439 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s003390000535 Document Type: Article

Times cited : (4)

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