SCOPUS 정보 검색 플랫폼

Volumn 147, Issue 9, 2000, Pages 3482-3486

Reduction of oxide tub isolation stress using a silicon nitride liner

Author keywords

[No Author keywords available]

Indexed keywords

BIPOLAR INTEGRATED CIRCUITS; SILICON NITRIDE; STRESS ANALYSIS;

OXIDE TUB ISOLATION (OTI);

CMOS INTEGRATED CIRCUITS;

EID: 0034272572 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.1393924 Document Type: Article

Times cited : (3)

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