Silicon nitrides studied by isothermal mechanical spectroscopy

Journal of Alloys and Compounds

Volumn 310, Issue 1-2, 2000, Pages 36-38

  Doen, B ^a   Gadaud, P ^a   Riviere A ^a  

^a ENSMA   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ANNEALING; CORRELATION METHODS; CREEP; GLASS TRANSITION; HIGH TEMPERATURE EFFECTS; INTERNAL FRICTION; MICROSTRUCTURE; RELAXATION PROCESSES; SPECTROSCOPIC ANALYSIS; VISCOUS FLOW;

GLASSY FILMS; ISOTHERMAL MECHANICAL SPECTROSCOPY; LAKKI'S RHEOLOGICAL MODEL;

SILICON NITRIDE;

EID: 0034270878     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-8388(00)01000-8     Document Type: Article

References (9)

1. A. Riviere, LMPM, ENSMA Poitiers, France, personal communication, 1993.
2. A Lakki Acta Metall. Mater. 43 2 1995 419
3. K Ota G Pezzotti Philos. Mag. A 73 1 1996 223
4. S Sakaguchi Yogyo-Kyokai-Shi 95 12 1987 1219
5. J Woirgard J. Phys., Paris 10 1981 1135
6. A. Thorel, PhD Thesis, ENS Mines Paris, France, 1988.
7. J. Perez, in: Lavoisier (Ed.), Physique et mecanique des polyméres amorphes, Paris, 1992.
8. B. Doen et al., J. Phys. IV 6 (1996) C8-707.
9. B. Doen, PhD Thesis, LMPM, ENSMA Poitiers, France, 1998.