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Volumn 23, Issue 10, 2000, Pages
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Challenges of next-generation lithography
a
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Author keywords
[No Author keywords available]
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Indexed keywords
COST ACCOUNTING;
INDUSTRIAL ECONOMICS;
MICROPROCESSOR CHIPS;
PHASE SHIFT KEYING;
SEMICONDUCTOR DEVICE MANUFACTURE;
NEXT GENERATION LITHOGRAPHY (NGL);
PHASE SHIFT MASKS (PSM);
PHOTOLITHOGRAPHY;
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EID: 0034270187
PISSN: 01633767
EISSN: None
Source Type: Journal
DOI: None Document Type: Article |
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Times cited : (3)
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References (0)
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