Void formation by the reactive diffusion of titanium and aluminum foils

Materials Transactions, JIM

Volumn 41, Issue 9, 2000, Pages 1244-1246

  Fukutomi, Hiroshi ^a   Nakamura, Mizuki ^a   Suzuki, Tetsuya ^b   Takagi, Shin Ichi ^c   Kikuchi, Shiomi ^d  

^a YOKOHAMA NATIONAL UNIVERSITY   (Japan)

^b IBARAKI UNIVERSITY   (Japan)

^c KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY   (Japan)

^d UNIVERSITY OF SHIGA PREFECTURE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; BINARY ALLOYS; CONDENSATION; CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; DIFFUSION IN SOLIDS; INTERMETALLICS; OPTICAL MICROSCOPY; PHASE DIAGRAMS; POINT DEFECTS; SOLUBILITY; TITANIUM ALLOYS;

TITANIUM ALUMINIDE; TITANIUM FOIL;

ALUMINUM FOIL;

EID: 0034264724     PISSN: 09161821     EISSN: None     Source Type: None    
DOI: 10.2320/matertrans1989.41.1244     Document Type: Article

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