Web-based course in the fundamentals of microelectronics processing

Chemical Engineering Education

Volumn 34, Issue 4, 2000, Pages 350-355

  Dang, Sanjit Singh ^a   Matthes, Raymond A ^a   Takoudis, Christos G ^a  

^a UNIVERSITY OF ILLINOIS AT CHICAGO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ENGINEERING; COMPUTER AIDED ENGINEERING; COMPUTER AIDED INSTRUCTION; CURRICULA; MICROELECTRONIC PROCESSING; PROFESSIONAL ASPECTS; STUDENTS; WORLD WIDE WEB;

WEB BASED COURSE; WEB BASED SIMULATION TOOLS;

ENGINEERING EDUCATION;

EID: 0034263080     PISSN: 00092479     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (21)

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17. For example: (a) Gordon, S., and B. J. McBride, Tech. Report SP-273, NASA, NASA Lewis Research Center (1971); (b) W. H. Gaynor, "Applicability of Thermodynamic Calculations on the Prediction of Chemical Vapor Deposition Reactor Performance and Process-Property Relationships," B.S. Thesis, School of Chemical Engineering, Purdue University (1989); Lee I-M., A. Jansons and C.G. Takoudis, "Effects of Water Vapor and Chlorine on the Epitaxial Growth of SiGe Films by Chemical Vapor Deposition - Thermodynamic Analysis," J. Vac. Sci. Techn. B 15, 880 (1997), and references therein;
18. For example: (a) Gordon, S., and B. J. McBride, Tech. Report SP-273, NASA, NASA Lewis Research Center (1971); (b) W. H. Gaynor, "Applicability of Thermodynamic Calculations on the Prediction of Chemical Vapor Deposition Reactor Performance and Process-Property Relationships," B.S. Thesis, School of Chemical Engineering, Purdue University (1989); Lee I-M., A. Jansons and C.G. Takoudis, "Effects of Water Vapor and Chlorine on the Epitaxial Growth of SiGe Films by Chemical Vapor Deposition - Thermodynamic Analysis," J. Vac. Sci. Techn. B 15, 880 (1997), and references therein;
19. For example: (a) Gordon, S., and B. J. McBride, Tech. Report SP-273, NASA, NASA Lewis Research Center (1971); (b) W. H. Gaynor, "Applicability of Thermodynamic Calculations on the Prediction of Chemical Vapor Deposition Reactor Performance and Process-Property Relationships," B.S. Thesis, School of Chemical Engineering, Purdue University (1989); Lee I-M., A. Jansons and C.G. Takoudis, "Effects of Water Vapor and Chlorine on the Epitaxial Growth of SiGe Films by Chemical Vapor Deposition - Thermodynamic Analysis," J. Vac. Sci. Techn. B 15, 880 (1997), and references therein;
20. C. Richardson, "Enhancement of the ThermoEMP Program for Calculation of Complex Chemical Equilibrium Compositions," NSF-REU Report, Department of Chemical Engineering, University of Illinois at Chicago (1998)
21. TSUPREM-4 - User's Manual, Version 6.4, Technology Modeling Associates, Inc. Sunnyvale, CA, October (1996)