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Thin Solid Films

Volumn 373, Issue 1-2, 2000, Pages 180-183

Dependency of reactive magnetron-sputtered SiC film quality on the deposition parameters

(4) Mahmood, A a Muhl, S a Sansores, L Enrique a Andrade, E a

a UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION EFFECTS; ELLIPSOMETRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MAGNETRON SPUTTERING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON CARBIDE; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

PROFILOMETRY; REACTIVE MAGNETRON SPUTTERING;

AMORPHOUS FILMS;

EID: 0034262901 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(00)01130-5 Document Type: Article

Times cited : (10)

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