Initial stage of film growth of pulsed laser deposited YMnO3

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 9 B, 2000, Pages 5525-5527

  Ito, Daisuke ^a   Fujimura, Norifumi ^a   Ito, Taichiro ^a  

^a Osaka Prefecture University   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC FIELDS; FILM GROWTH; OXYGEN; OZONE; PRESSURE; PULSED LASER DEPOSITION; STOICHIOMETRY;

LASER POWER DENSITY; METAL-FERROELECTRIC-INSULATOR-SEMICONDUCTOR; OXYGEN GAS PRESSURE; POLARIZATION ELECTRIC FIELD MEASUREMENT;

YTTRIUM COMPOUNDS;

EID: 0034262443     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.5525     Document Type: Article

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