Residual stress optimization in FeAlN pole materials

IEEE Transactions on Magnetics

Volumn 36, Issue 5 I, 2000, Pages 2536-2538

  Zou, Pei ^a,b   Bain, James A ^a,c  

^a IEEE   (United States)

^b WESTERN DIGITAL CORPORATION   (United States)

^c CARNEGIE MELLON UNIVERSITY   (United States)

Author keywords

FeAlN, residual stress; Lamination; Magnetic films; Recording head pole materials; Stripe domain

Indexed keywords

MAGNETIC FILMS; MAGNETIC FLUX; MAGNETIC HEADS; MAGNETIC PROPERTIES; MAGNETIC RECORDING; MAGNETIC SUSCEPTIBILITY; RESIDUAL STRESSES;

CRITICAL THICKNESS; FLUX RATIO;

MAGNETIC MATERIALS;

EID: 0034260887     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/20.908498     Document Type: Article

References (10)

1. RF-diode-sputtered iron nitride films for thin film recording head materials
2. Thin film tape recording heads with high moment FeAlN poles
3. Magnetic properties of thin ferromagnetic films in relation to their structure
4. The effects of deposition parameters on iron films diode sputtered in argon-nitrogen
5. Stress-related effects in thin films
6. Magnetic and structural characterization of sputtered FeN multilayer films
7. Micromagnetics on stripe domain films. I. Critical cases
8. Magnetostriction constants of (110) oriented epitaxially grown FeTaN thin films
9. The effect of nitrogen partitioning on the magnetic properties of FeAlN films
10. Effects of lamination on soft magnetic properties of FeN films on sloping surfaces