Sensitive asymmetrical MI effect in crossed anisotropy sputtered films

IEEE Transactions on Magnetics

Volumn 36, Issue 5 I, 2000, Pages 3448-3450

  Ueno, K ^a   Hiramoto, H ^a   Mohri, K ^b   Uchiyama, T ^b   Panina, L V ^c  

^a STANLEY ELECTRIC CO LTD   (Japan)

^b NAGOYA UNIVERSITY   (Japan)

^c Moscow Technical Physics Institute   (Russian Federation)

Author keywords

Crossed anisotropy; MI effect; Sputtered films

Indexed keywords

ELECTRIC FIELD EFFECTS; GLASS; MAGNETIC ANISOTROPY; SENSORS; SPUTTER DEPOSITION; SUBSTRATES;

CROSSED ANISOTROPY; MAGNETO-IMPEDANCE (MI) EFFECTS; SPUTTERED FILMS;

MAGNETIC FILMS;

EID: 0034260671     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/20.908857     Document Type: Article

References (4)

1. Application of amorphous magnetic wires to computer peripherals
2. Analysis of magneto-impedance in multilayers with crossed anisotropy