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Volumn 36, Issue 5 I, 2000, Pages 2315-2320
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Novel sputtering process to reduce the grain size and its distribution in Co-based longitudinal thin film media - New seedlayer and high KuGrain material
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Author keywords
Co co precipitated NiP Al substrate; Co Ge Cr alloy; Dry etching; High magnetocrystalline anisotropy material; Oxygen exposure; Seedlayer
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Indexed keywords
COBALT ALLOYS;
COERCIVE FORCE;
DRY ETCHING;
GRAIN SIZE AND SHAPE;
MAGNETIC PROPERTIES;
MAGNETIC RECORDING;
NICKEL ALLOYS;
PRECIPITATION (CHEMICAL);
SIGNAL TO NOISE RATIO;
SPUTTERING;
COPRECIPITATION;
MAGNETIC THIN FILM DEVICES;
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EID: 0034260575
PISSN: 00189464
EISSN: None
Source Type: Journal
DOI: 10.1109/20.908415 Document Type: Article |
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Times cited : (8)
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References (13)
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