A micromachined silicon depth probe for multichannel neural recording

IEEE Transactions on Biomedical Engineering

Volumn 47, Issue 8, 2000, Pages 1082-1087

  Tae Hwan Yoon, ^a   Eun Jung Hwang, ^a   Dong Yong Shin, ^a   Sek Ik Park, ^a   Seung Jae Oh, ^a   Sung Cherl Jung, ^a   Hyung Cheul Shin, ^a   Sung June Kim, ^a  

^a Seoul National University   (South Korea)

Author keywords

Mechanical stress test; Multichannel simultaneous recording; Neural probes; Plasma etch; Silicon microelectrode array

Indexed keywords

CMOS INTEGRATED CIRCUITS; DIGITAL SIGNAL PROCESSING; MICROELECTRODES; NEURAL NETWORKS; NEUROLOGY; PROBES; SIGNAL TO NOISE RATIO;

MICROMACHINED SILICON DEPTH PROBE; MULTICHANNEL NEURAL RECORDING; NEURAL PROBES; SOMATOSENSORY CORTEX;

BIOELECTRIC POTENTIALS;

OXIDE; SILICON;

ANIMAL EXPERIMENT; ARTICLE; CONTROLLED STUDY; DEVICE; LOW TEMPERATURE; MACHINE; MECHANICAL STRESS; MICROELECTRODE; MULTICHANNEL RECORDER; NONHUMAN; RAT; SIGNAL NOISE RATIO; SOMATOSENSORY CORTEX; THICKNESS;

ANIMALS; BIOMEDICAL ENGINEERING; EQUIPMENT DESIGN; MICROELECTRODES; NEURONS; RATS; RATS, SPRAGUE-DAWLEY; SILICON; SOMATOSENSORY CORTEX;

EID: 0034254373     PISSN: 00189294     EISSN: None     Source Type: Journal    
DOI: 10.1109/10.855936     Document Type: Article

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