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Volumn 33, Issue 16, 2000, Pages 5995-5998

Atomic force microscopic study of stretching a single polymer chain in a polymer brush

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CURVE FITTING; FREE RADICAL POLYMERIZATION; GEL PERMEATION CHROMATOGRAPHY; GRAFTING (CHEMICAL); MATHEMATICAL MODELS; MOLECULAR DYNAMICS; MOLECULAR STRUCTURE; POLYMETHYL METHACRYLATES; SILICON; TOLUENE; VINYL RESINS;

EID: 0034250769     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma000225u     Document Type: Article
Times cited : (105)

References (24)
  • 14
    • 0343869383 scopus 로고    scopus 로고
    • note
    • a a silicon wafer with 2-(4-cholorosulfonylphenyl) ethyl trichlorosilane (Gelest, Inc.) fixed on it was subjected to the graft polymerization at 90 °C for 6 h in a degassed diphenyl ether solution containing CuBr (10 mM), 4,4′-di-n-heptyl-2,2′-bipyridine (20 mM), methyl methacrylate (4.7 M), and p-toluenesulfonyl chloride (4.8 mM). After polymerization, the substrate was rinsed in a Soxhlet extractor with toluene for 12 h to remove physisorbed polymers and impurities.
  • 18
    • 0342563735 scopus 로고    scopus 로고
    • note
    • n) of 2800 and 1.14, respectively.
  • 23
    • 0004134837 scopus 로고
    • John Wiley & Sons: New York
    • Drexler, K. E. Nanosystems; John Wiley & Sons: New York, 1992.
    • (1992) Nanosystems
    • Drexler, K.E.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.