Fabrication of ZnO-based film bulk acoustic resonator devices using W/SiO2 multilayer reflector

Electronics Letters

Volumn 36, Issue 16, 2000, Pages 1435-1437

  Yoon, Giwan ^a   Park, Jae Don ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; MIRRORS; OPTICAL MULTILAYERS; SILICA; TUNGSTEN; ZINC OXIDE;

FILM BULK ACOUSTIC RESONATORS (FBAR);

ACOUSTIC RESONATORS;

EID: 0034250336     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:20000986     Document Type: Article

References (5)

1. KRISHNASWAMY, S.V., ROSENBAUM, J.F., HOWITZ, S., and MOORE, R.A.: 'Film bulk acoustic wave resonator technology'. IEEE Ultrasonics Symp., 1990, pp. 529-536
2. LAKIN, K.M., KLINE, G.R., and MCCARRON, K.T.: 'Development of miniature filters for wireless applications', IEEE Trans. Microw. Theory Tech., 1995, 43, (12), pp. 2933-2939
3. VAN DE POL, F.C.M., BLOM, F.R., and POPMA, T.J.A.: 'AF planar magnetron sputtered ZnO films. I. Structural properties', Thin Solid Films, 1991, 204, pp. 349-364
4. RUBY, R., BRADLEY, P., LARSON, J.D., III, and OSHMYANSKY, Y.: 'PCS 1900 MHz duplexer using thin film bulk acoustic resonators (FBARs)', Electron. Lett., 1999, 35, (10), pp. 794-795
5. NEWELL, W.E.: 'Face-mounted piezoelectric resonators', Proc. IEEE, 1965, 53, pp. 575-581