High-temperature stability of low-oxygen silicon carbide fiber heat-treated under different atmosphere

Journal of Materials Science

Volumn 35, Issue 15, 2000, Pages 3733-3739

  Shimoo, T ^a   Okamura, K ^a   Ito, M ^a   Takeda, M ^b  

^a Osaka Prefecture University   (Japan)

^b Research Laboratory   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; ARGON; CURING; ELECTRON IRRADIATION; HEAT TREATMENT; HIGH TEMPERATURE EFFECTS; NITROGEN; SILICON CARBIDE; STRENGTH OF MATERIALS; SURFACES; THERMODYNAMIC STABILITY; VACUUM;

ELECTRON BEAM IRRADIATION CURING; LOW OXYGEN SILICON CARBIDE FIBER; SILICON OXYCARBONITRIDE;

CERAMIC FIBERS;

EID: 0034248923     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1004856725352     Document Type: Article

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