Structure and morphological studies of thin porous silicon layers

Vacuum

Volumn 58, Issue 2, 2000, Pages 351-357

  Vitanov, P ^a   Delibasheva, M ^a   Goranova, E ^a   Angelov, Ch ^b   Dimov, V ^c  

^a CTRL LAB SOLAR ENER NEW ENER S   (Bulgaria)

^b INSTITUTE FOR NUCLEAR RESEARCH AND NUCLEAR ENERGY   (Bulgaria)

^c Ctrl Lab of Mineral and Cristal   (Bulgaria)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTALLINE MATERIALS; ELECTROCHEMISTRY; ETCHING; MORPHOLOGY; POROUS SILICON; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE STRUCTURES; SILICON WAFERS; THIN FILMS;

ELECTROCHEMICAL ETCHING;

SEMICONDUCTING FILMS;

EID: 0034248748     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(00)00190-1     Document Type: Article

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