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Volumn 85, Issue 1, 2000, Pages 133-138

Microwave enhanced fast anisotropic etching of monocrystalline silicon

Author keywords

[No Author keywords available]

Indexed keywords

DRY ETCHING; MEMBRANES; MICROMACHINING; SINGLE CRYSTALS; SUBSTRATES;

EID: 0034248455     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(00)00373-3     Document Type: Article
Times cited : (29)

References (12)
  • 3
    • 84975413933 scopus 로고
    • A water amine complexing agent system for etching silicon
    • Finne R.M., Klein D.L. A water amine complexing agent system for etching silicon. J. Electrochem. Soc. 114(9):1967;965-970.
    • (1967) J. Electrochem. Soc. , vol.114 , Issue.9 , pp. 965-970
    • Finne, R.M.1    Klein, D.L.2
  • 4
    • 0020127035 scopus 로고
    • Silicon as a mechanical material
    • Petersen K. Silicon as a mechanical material. Proc. IEEE El. Dev. 70(5):1982;420-457.
    • (1982) Proc. IEEE El. Dev. , vol.70 , Issue.5 , pp. 420-457
    • Petersen, K.1
  • 5
    • 0018506572 scopus 로고
    • The controlled etching of silicon in catalysed ethylenediamine-pyrocatehol water solutions
    • Reismann A., Barkenblit M., Char S.A., Kaufman F.B., Green D.G. The controlled etching of silicon in catalysed ethylenediamine-pyrocatehol water solutions. J. Electrochem. Soc. 126(8):1979;1406-1415.
    • (1979) J. Electrochem. Soc. , vol.126 , Issue.8 , pp. 1406-1415
    • Reismann, A.1    Barkenblit, M.2    Char, S.A.3    Kaufman, F.B.4    Green, D.G.5
  • 7
    • 0029296706 scopus 로고
    • Silicon anisotropic etching in KOH-isopropanol etchant
    • Barycka I., Zubel I. Silicon anisotropic etching in KOH-isopropanol etchant. Sens. Actuators, A. 48:1995;229-238.
    • (1995) Sens. Actuators, a , vol.48 , pp. 229-238
    • Barycka, I.1    Zubel, I.2
  • 8
    • 0020734699 scopus 로고
    • A Raman study of etching silicon in aqueous KOH
    • Palik E.D., Gray H.F., Klein P.B. A Raman study of etching silicon in aqueous KOH. J. Electrochem. Soc. 130(2):1983;956-959.
    • (1983) J. Electrochem. Soc. , vol.130 , Issue.2 , pp. 956-959
    • Palik, E.D.1    Gray, H.F.2    Klein, P.B.3
  • 11
    • 0027624222 scopus 로고
    • On the mechanism of anisotropic etching of silicon
    • Elwenspoek M. On the mechanism of anisotropic etching of silicon. J. Electrochem. Soc. 140:1993;2075-2080.
    • (1993) J. Electrochem. Soc. , vol.140 , pp. 2075-2080
    • Elwenspoek, M.1
  • 12
    • 0343123325 scopus 로고
    • The mechanism of electrochemical and anistropic etching of silicon and its application
    • F. Harashime. Elsevier
    • Seidel H. The mechanism of electrochemical and anistropic etching of silicon and its application. Harashime F. Integrated Micromotion Systems. 1990;51-68 Elsevier.
    • (1990) Integrated Micromotion Systems , pp. 51-68
    • Seidel, H.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.