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Vacuum

Volumn 58, Issue 2, 2000, Pages 420-427

FeSi2 thin films investigated by X-ray photoelectron and infrared spectroscopy

(5) Toneva, A a,b Goranova, E a Beshkov, G b Marinova, Tsv c Kakanakova Georgieva, A c

a CTRL LAB SOLAR ENER NEW ENER S (Bulgaria)

b INSTITUTE OF SOLID STATE PHYSICS (Bulgaria)

c INSTITUTE OF GENERAL AND INORGANIC CHEMISTRY (Bulgaria)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; BINDING ENERGY; CHEMICAL BONDS; ELECTRON BEAMS; EVAPORATION; INFRARED SPECTROSCOPY; ION BEAMS; IRON ALLOYS; PHASE COMPOSITION; RAPID THERMAL ANNEALING; SEMICONDUCTING SILICON; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRON-BEAM EVAPORATION; ION SPUTTERING; ION-BEAM EVAPORATION; IRON SILICIDE;

SEMICONDUCTING FILMS;

EID: 0034248171 PISSN: 0042207X EISSN: None Source Type: Journal
DOI: 10.1016/S0042-207X(00)00200-1 Document Type: Article

Times cited : (2)

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