Beneath the MEEF

Solid State Technology

Volumn 43, Issue 8, 2000, Pages

  Kim, Byung Gook ^a   Choi, Seong Woon ^a   Han, Woo Sung ^a   Sohn, Jung Min ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGING TECHNIQUES; MASKS; PHOTOLITHOGRAPHY;

CRITICAL DIMENSION (CD); MASK ERROR ENHANCEMENT FACTOR (MEEF);

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0034247837     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (2)