Electron-beam-induced patterning of thin film arsenic-based chalcogenides

Applied Surface Science

Volumn 162, Issue , 2000, Pages 464-468

  Mietzsch, K ^a   Fitzgerald, A G ^a  

^a UNIVERSITY OF DUNDEE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ARSENIC; ELECTRON BEAM LITHOGRAPHY;

AMORPHOUS CHALCOGENIDES;

SEMICONDUCTING FILMS;

EID: 0034246838     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00234-8     Document Type: Article

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3. Yoshida N., Tanaka K. Journal of Non-Crystalline Solids. 210:1997;119.
4. Tanaka K. Applied Physics Letters. 70(2):1997;261.
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6. Yoshida N., Itoh M., Tanaka K. Journal of Non-Crystalline Solids. 198-200:1996;749.
7. Fitzgerald A.G., McHardy C.P. Surface Science. 162:1985;568.
8. McHardy C.P., Fitzgerald A.G., Moir P.A., Flynn M. J. Phys. C: Solid State Phys. 20:1987;4055.