Monitoring photoresist glass transition temperature versus processing parameters via NMR broad band spectroscopy

Microelectronics Journal

Volumn 31, Issue 8, 2000, Pages 677-683

  Nicolau, D V ^a   Bercu, C ^b  

^a SWINBURNE UNIVERSITY OF TECHNOLOGY   (Australia)

^b NATIONAL RESEARCH AND DEVELOPMENT INSTITUTE FOR CHEMISTRY AND PETROCHEMISTRY ICECHIM   (Romania)

Author keywords

[No Author keywords available]

Indexed keywords

GLASS TRANSITION; LITHOGRAPHY; MOLECULAR WEIGHT; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; ONLINE SYSTEMS; OPTIMIZATION; PHOTORESISTS;

NUCLEAR MAGNETIC RESONANCE (NMR) BROAD BAND SPECTROSCOPY;

MICROELECTRONIC PROCESSING;

EID: 0034246042     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2692(00)00014-8     Document Type: Article

References (5)

1. NMR Spectroscopy of Polymers. Ibbett R.N. 1993;Chapman & Hall, London.
2. Heffner S.A., Galvin M.A., Reichmanis E., Gerena L., Mirau P.A. Hydrogen bonding in sulfone- and N-methylmaleimide-containing resist polymers with hydroxystyrene and acetoxystyrene. Reichmanis E., Ober C.K., MacDonald S.A., Iwayanagi T., Nishikubo T. Microelectronics Technology. Polymers for Advanced Imaging and Packaging. ACS Symposium Series 614. 1997;ACS, Washington, DC. (chap. 11).
3. Heffner S.A., Mixon D.A., Novembre A.E., Mirau P.A. NMR investigation of miscibility in novolac-poly(2-methyl-1-pentene sulfone) resists. Reichmanis E., Ober C.K., MacDonald S.A., Iwayanagi T., Nishikubo T. Microelectronics Technology. Polymers for Advanced Imaging and Packaging. ACS Symposium Series 614. 1997;ACS, Washington DC. (chap. 12).
4. For a short review on the method and references regarding applications: H.N. Cheng, NMR characterization of polymers, in: H.G. Barth, J.W. Mays (Eds.), Modern Methods of Polymer Characterization, chap. 11, Wiley, New York, 1991.
5. Dammel R. Diazonaphtoquinone-based Resists. 1993;SPIE Optical Engineering Press, Bellingham.