Double-excitation and double-escape processes studied by photoelectron spectroscopy near threshold

Journal of Physics B: Atomic, Molecular and Optical Physics

Volumn 33, Issue 16, 2000, Pages

  King, George C ^a   Avaldi, Lorenzo ^b  

^a UNIVERSITY OF MANCHESTER   (United Kingdom)

^b Ist Metodologie Avanzate I   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON TRANSPORT PROPERTIES; HELIUM; IMPACT IONIZATION; KINETIC ENERGY; PHOTOELECTRON SPECTROSCOPY; PHOTONS; POSITIVE IONS;

DOUBLE ESCAPE PROCESS; DOUBLE EXCITATION PROCESS; PENETRATING FIELD TECHNIQUE; THRESHOLD PHOTODOUBLE IONIZATION; THRESHOLD PHOTOELECTRON SPECTROSCOPY;

MOLECULAR PHYSICS;

EID: 0034245954     PISSN: 09534075     EISSN: None     Source Type: Journal    
DOI: 10.1088/0953-4075/33/16/201     Document Type: Article

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