Prediction of surface segregation of substrate metal on deposited film

Surface and Interface Analysis

Volumn 30, Issue 1, 2000, Pages 337-340

  Yoshitake, Michiko ^a   Yoshihara, Kazuhiro ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; AUGER ELECTRON SPECTROSCOPY; GRAIN BOUNDARIES; POLYCRYSTALLINE MATERIALS; SEGREGATION (METALLOGRAPHY); SUBSTRATES; X RAY PHOTOELECTRON SPECTROSCOPY;

SURFACE SEGREGATION;

METALLIC FILMS;

EID: 0034245209     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/1096-9918(200008)30:1<337::AID-SIA854>3.0.CO;2-1     Document Type: Article

References (6)

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2. Yoshitake M, Yoshihara K. J. Vac. Sci. Technol. A 1995; 13: 2407.
3. Yoshitake M, Yoshihara K. Vacuum 1998; 51: 369.
4. Yoshitake M, Yoshihara K. J. Jpn. Inst. Met. 1994; 58: 768.
5. Miedema AR, Dorleijn JWF. Sur. Sci. 1980; 95: 447.
6. Boom R, deDoer FR, Miedema AR. J. Less. Common Met. 1976; 46: 271.