Deep-UV antireflective coating: Ellipsometry and XPS characterization

Surface and Interface Analysis

Volumn 30, Issue 1, 2000, Pages 531-533

  Boddaert, X ^a   Caramante, A ^a   Josse, E ^a   Delahaye, B ^a  

^a IBM   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; ELLIPSOMETRY; LIGHT ABSORPTION; PHOTOLITHOGRAPHY; REFRACTIVE INDEX; STOICHIOMETRY; ULTRAVIOLET RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

OXYNITRIDES;

ANTIREFLECTION COATINGS;

EID: 0034245032     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/1096-9918(200008)30:1<531::AID-SIA840>3.0.CO;2-Q     Document Type: Article

References (2)

1. Cirelli RA et al. J. Voc. Sci. Technol. 1996; B14(6): 4229.
2. Bencher C, Chu T, Tan WT, Zou G. SPIE 1997; 3183: 255.