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Volumn 35, Issue 11, 2000, Pages 1837-1842
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Wurtzite GaN epitaxial growth on Si(111) using silicon nitride as an initial layer
a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
EVAPORATION;
FILM GROWTH;
PHOTOLUMINESCENCE;
SEMICONDUCTING GALLIUM COMPOUNDS;
SINGLE CRYSTALS;
X RAY DIFFRACTION ANALYSIS;
DOUBLE CRYSTAL X RAY DIFFRACTION (DCXRD);
EPILAYERS;
FULL-WIDTH AT HALF MAXIMUM (FWHM);
SEMICONDUCTING FILMS;
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EID: 0034240635
PISSN: 00255408
EISSN: None
Source Type: Journal
DOI: 10.1016/S0025-5408(00)00393-7 Document Type: Article |
Times cited : (13)
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References (14)
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