Optimization of the reflectivity of magnetron sputter deposited silver films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 4 II, 2000, Pages 1632-1637

  Vergohl M ^a   Malkomes, N ^a   Szyszka, B ^a   Neumann, F ^a   Matthee T ^a   Brauer G ^b  

^a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

^b EVONIK INDUSTRIES AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COMPOSITION EFFECTS; ELECTRIC CONDUCTIVITY MEASUREMENT; ELLIPSOMETRY; LIGHT REFLECTION; MAGNETRON SPUTTERING; METALLIC FILMS; PRESSURE EFFECTS; SILVER; SPECTROPHOTOMETRY; SPUTTER DEPOSITION; THERMAL EFFECTS;

SPECTROSCOPIC ELLIPSOMETRY;

OPTICAL FILMS;

EID: 0034230210     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582397     Document Type: Article

References (7)

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