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Volumn 63, Issue 3, 2000, Pages 227-235

Cross-sectional high-resolution transmission electron microscopy of the microstructure of electrochromic nickel oxide

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; ELECTROCHROMISM; GRAIN SIZE AND SHAPE; HIGH RESOLUTION ELECTRON MICROSCOPY; INDIUM COMPOUNDS; NICKEL COMPOUNDS; SUPERLATTICES; TRANSMISSION ELECTRON MICROSCOPY;

EID: 0034229846     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(00)00012-X     Document Type: Article
Times cited : (5)

References (14)
  • 13
    • 0005330914 scopus 로고
    • The nickel oxide elctrochromic films deposited by rf reactive sputtering
    • (in Chines)
    • Hu X., Chen X., Tain J. The nickel oxide elctrochromic films deposited by rf reactive sputtering. J. Inorg. Mater. 7(3):1992;356. (in Chines).
    • (1992) J. Inorg. Mater. , vol.7 , Issue.3 , pp. 356
    • Hu, X.1    Chen, X.2    Tain, J.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.