Characterize low-k and copper films in situ

Semiconductor International

Volumn 23, Issue 8, 2000, Pages 239-240,-242,-244

  Lau, S H ^a   Huang, Steve ^a   Koo, Ann ^a  

^a Frontier Semiconductor   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; COPPER; ELECTRIC CONDUCTIVITY; INERT GASES; THERMAL CYCLING; THERMAL STRESS; VINYL RESINS;

COPPER FILM; INTEGRATED METROLOGY TOOL; THERMAL DESORPTION SPECTROSCOPY;

THIN FILMS;

EID: 0034228184     PISSN: 01633767     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (0)