Preparation and characterization of rf-sputtered SrTiO3 thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 4 II, 2000, Pages 1638-1641

  Radhakrishnan, K ^a   Tan, C L ^a   Zheng, H Q ^a   Ng, G I ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; MAGNETRON SPUTTERING; PARTIAL PRESSURE; PERMITTIVITY; PRESSURE EFFECTS; SEMICONDUCTING GALLIUM ARSENIDE; SILICON WAFERS; SPUTTER DEPOSITION; STRONTIUM COMPOUNDS; THERMAL EFFECTS; THIN FILMS;

STRONTIUM TITANATE;

DIELECTRIC FILMS;

EID: 0034226558     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582398     Document Type: Article

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