Fabrication of coplanar microstructures composed of multiple organosilane self-assembled monolayers

IEICE Transactions on Electronics

Volumn E83-C, Issue 7, 2000, Pages 1099-1102

  Sugimura, Hiroyuki ^a   Hozumi, Atsushi ^a   Tarat, Osamu ^b  

^a NAGOYA UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Chemical vapor deposition; Excimer lamp; Organosilane self assembled monolayer; Photolithography; Scanning probe microscope

Indexed keywords

COPLANAR MICROSTRUCTURE; ORGANIC THIN FILM; ORGANOSILANE; SCANNING PROBE MICROSCOPE; SELF ASSEMBLED MONOLAYER; VACUUM ULTRAVIOLET;

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; CHEMISORPTION; EXCIMER LASERS; IRRADIATION; MICROSTRUCTURE; MOLECULES; PHOTOLITHOGRAPHY; SILANES; SUBSTRATES; X RAY PHOTOELECTRON SPECTROSCOPY;

MONOLAYERS;

EID: 0034226397     PISSN: 09168524     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (34)

1. R. R. Birge, ed. , Molecular Electronics and Bioelectronics, American Chemical Society, Washington, DC, 1994.
2. A. J. Bard, Integrated Chemical Systems, John Wiley & Sons. Inc. , New York, 1994.
3. H. Masuhara, Microchemistry: Spectroscopy and Chemistry in Small Domains, H. Masuhara, F. C. De Schryver, N. Kitamura and N. Tamai, eds. , pp. 3-20, North-Holland, NLD, 1994.
4. W. J. Dressick and J. M. Calvett, "Patterning of Self-Assembled Films Using Lithographic Exposure Tools," Jpn. J. Appl. Phys. , vol. 32, p. 5829, 1993.
5. M. J. Lercel, H. G. Craighead, A. N. Parikh, K. Seshadri, and D. L. Allara, "Plasma etching with self-assembled monolayer masks for nanostructure fabrication," J. Vac. Sei. Technol. B, vol. 14, p. 1844, 1996.
6. H. Sugimura and N. Nakagiri, "Combination of photo and AFM lithographies by use of an organosilane monolayer resjst," Jpn. J. Appl. Phys. , vol. 36, p. L968, 1997.
7. D. W. Wang, S. G. Thomas, K. L. Wang, Y. Xia, and G. M. Whitesides, "Nanometer scale patterning and pattern transfer on amorphous Si. crystalline Si, and SiO2 surfaces using self-assembled monolayers," Appl. Phys. Lett. , vol. 60, p. 1593, 1997.
8. S. P. A. Fodor, J. L. Read, M. C. Pirrung, L. Stryer, A. T. Lu, and D. Solas, "Light-directed, spatially addressable parallel chemical synthesis," Science, vol. 251, p. 767, 1991.
9. P. ConnolIy, J. Cooper, G. R. Moores, J. Shen, and G. Thompson, "Development of milecular patternning and immobilization techniques for scanning tunneling microscopy and atomic force microscopy," Nanotechnology, vol. 2, p. 160, 1991.
10. S. Britland, E. Perez-Arnaud, P. Clark, B. McGinn, P. ConnolIy, and G. Moores, "Micropatterning proteins and synthetic peptides on solid supports: A novel application for microelectronics fabrication technology," Biotechnol. Prog. , vol. 8, p. 155, 1992.
11. A. Takahara, K. Koiji, S. -R. Ge, andT. Kajiyama, "Scanning force microscopic studies of surface structure and protein adsorption behavior of organosilane monolayers," J. Vac. Sei. Technol. A, vol. 14, p. 1747, 1996.
12. D. C. Turner, C. Chang, K. Fang, S. L. Brandow, and D. B. Murphy, "Selective adhesion of functional microtubes to patterned silane surfaces," Biophys. J. , vol. 69, p. 2782, 1995.
13. H. Sugimura and N. Nakagiri, "Nanoscopic surface architecture based on scanning probe electrochemistry and molecular selfassembly," J. Am. Chem. Soc. , vol. 119, p. 9226, 1997.
14. D. Kleinfeld, K. H. Kahler, and P. E. Hockberger, "Controlled outgrowth of dissociated neurons on patterned substrate," J. Neurosci. , vol. 8, p. 4098, 1988.
15. M. Matsuzawa, S. Tokumitsu, W. KnoIl, and H. Sasabe, "Effect of organosilane monolayer gilms of the geometrical guidance of CNS neurons," Langmuir, vol. 14, p. 5133, 1998.
16. J. M. Calvert, M. -S. Chen, C. S. Dulcey, J. H. Georger, M. C. Peckearar, J. M. Schnur, and P. E. Schoen, "Deep ultraviolet pattrening of monolayer for high resolution lithography," J. Vac. Sei. Technol. B, vol. 9, p. 3447, 1991.
17. W. J. Dressick, C. S. Dulcey, J. H. Georger, and J. M. Calvert, "Photopatteming and selective electroless metalization of surface-attached ligands," Chem. Mater. , vol. 5, p. 148, 1993.
18. N. LJeon, R. G. Nuzzo, Y. Xia, M. Mrksich, and G. M. Whitesides, Langmuir, vol. 8, p. 3024, 1995.
19. H. Sugimura and N. Nakagiri, Thin Solid Films, vol. 281, p. 572, 1996.
20. N. LJeon, P. G. Clem, D. A. Payne, and R. G. Nuzzo, "Patterned self-assembled monolayers formed by microcontact printing direct selective metalization by chemical vapor deposition on planar and nonplanar substrates," Langmuir, vol. 12, p. 5350, 1996.
21. P. C. Rieke, B. J. Tarasevich, L. L. Wood, M. H. Engelhard, D. R. Baer, G. E. Fryxell, CM John, D. A. Laken, and M. C Jaehnig, "Spatially resolved mineral deposition on patterned self-assembled monolayers," Langmuir, vol. 10, p. 619, 1994.
22. R. J. CoIlins, H. Shin, M. R. DeGuire, A. H. Heuer, and C. N. Sukenik, "Low temperature deposition of patterned TiO2 thin films using photopatterned self-assembled monolayers," Appl. Phys. Lett. , vol. 69, p. 860, 1996.
23. K. Koumoto, S. Seo, T. Sugiyama, W. S. Seo, and W. J. Dressick, "Micropatterning of titanium dioxide on self-assembled monolayers using a liquid-phase deposition process," Chem. Mater. , vol. ll,p. 2305, 1999.
24. Z. Huang, P. -C. Wang, A. G. MacDiarmid, X. Xia, and G. M. Whiteisides, "Selective deposition of conducting polymers on hydroxyl-terminated surfaces with printed monolayers of alkylsiloxanes as templates," Langmuir, vol. 13, p. 6480, 1997.
25. T. Sato, D. G. Hasko, and H J. Ahmed, "Nanoscale colloidal particles: Monolayer organization and patterning," Vac. Sei. Technol. B, vol. 15, p. 45, 1997.
26. C. S. Dulcey, J. H. Georger, Jr. , V. Krauthamer, D. A. Stenger, T. L. Fare, and J. M. Calvert, "Deep UV photochemistry of chemisorbed monolayers: Patterned coplanar molecular assemblies," Science, vol. 252, p. 551,1991.
27. N. Ichinose, H. Sugimura, T. Uchida, N. Shimo, and H. Masuhara, "Photochemical micropatetrning of silylated glass surface bearing 3-phenyldithiopropyl group by KrF laser irradiation," Chem. Lett. , p. 1961,1993.
28. S. L. Brandow, M. -S. Chen, R. Aggarwal, C. S. Dulcey, J. M. Calvert, and W. J. Dressick, "Fabrication of patterned amine reactivity templates using 4-chloromethylphenylsiloxane selfassembled monolayer films," Langmuir, vol. 15, p. 5429, 1999.
29. H. Sugimura and N. Nakagiri, "Force microscopy imaging of photopatterned organosilane monolayers: Application to probe alignment in AFM patterning following the photolithography," Appl. Phys. A, vol. 66, p. S427, 1998.
30. H. Sugimura, K. Ushiyama, A. Hozumi, and O'. Takai, "FluoroAlkylsilane Monolayers Formed by Chemical Vapor Surface Modification on Hydroxylated Oxide Surfaces," Langmuir vol. l6,p. 885,2000.
31. H. Sugimura and N. Nakagiri, "Organosilane monolayer resist for scanning probe lithography," J. Photopolym. Sei. Technol. , vol. 10, p. 661, 1997.
32. A. Hozumi, K. Ushiyama, H. Sugimura, :and O. Takai, "Micropatterning of alkyl and fluoroalkylsilane self-assembled monolayers using vacuum ultra-violet light," Langmuir, vol. 15, p. 7600, 1999.
33. A. Hollander, J. E. Klemberg-Sapieha, and M. R. Wertheimer, "Vacuum-ultraviolet-induced oxidation of polyethylene," Macromolecule, vol. 27, pp. 2893, 1994.
34. M. Yasutake, D. Aoki, and M. Fujihira, "Surface potential measurements using the Kelvin probe force microscope," Thin Solid Films, vol. 273, p. 279, 1996.