Heteroepitaxial growth of SrO on hydrogen-terminated Si(100) surface

Thin Solid Films

Volumn 369, Issue 1, 2000, Pages 273-276

  Asaoka, Hidehito ^a   Saiki, Koichiro ^b   Koma, Atushi ^b   Yamamoto, Hiroyuki ^a  

^a JAPAN ATOMIC ENERGY AGENCY   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL GROWTH; SEMICONDUCTING FILMS; STRONTIUM COMPOUNDS; SUBSTRATES; THIN FILMS;

HETEROEPITAXY; STRONTIUM OXIDE;

SEMICONDUCTING SILICON;

EID: 0034225277     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)00877-4     Document Type: Article

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