ESR investigations of modulation-doped Si/SiGe quantum wells

Thin Solid Films

Volumn 369, Issue 1, 2000, Pages 312-315

  Sandersfeld, N ^a   Jantsch, W ^a   Wilamowski, Z ^a,b   Schaffler F ^a  

^a JOHANNES KEPLER UNIVERSITY LINZ   (Austria)

^b INSTITUTE OF PHYSICS   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITION REACTIONS; CARRIER CONCENTRATION; COMPOSITION EFFECTS; ELECTROMAGNETIC WAVE ABSORPTION; ELECTRON GAS; PARAMAGNETIC RESONANCE; REACTION KINETICS; RELAXATION PROCESSES; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DOPING; SEMICONDUCTOR QUANTUM WELLS; THIN FILMS;

MICROWAVE ABSORPTION; MODULATION DOPING;

SEMICONDUCTING FILMS;

EID: 0034224496     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)00870-1     Document Type: Article

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