|
Volumn 161, Issue 3, 2000, Pages 459-464
|
Modification of tin dioxide thin films by ion implantation
|
Author keywords
[No Author keywords available]
|
Indexed keywords
AMORPHOUS FILMS;
ANNEALING;
CRYSTALLINE MATERIALS;
ION IMPLANTATION;
PHASE TRANSITIONS;
SEMICONDUCTING TIN COMPOUNDS;
SPUTTER DEPOSITION;
SURFACE TREATMENT;
THERMAL EFFECTS;
THIN FILMS;
TIN DIOXIDE;
SEMICONDUCTING FILMS;
|
EID: 0034224396
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/S0169-4332(00)00359-7 Document Type: Article |
Times cited : (7)
|
References (21)
|