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Volumn 161, Issue 3, 2000, Pages 459-464

Modification of tin dioxide thin films by ion implantation

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ANNEALING; CRYSTALLINE MATERIALS; ION IMPLANTATION; PHASE TRANSITIONS; SEMICONDUCTING TIN COMPOUNDS; SPUTTER DEPOSITION; SURFACE TREATMENT; THERMAL EFFECTS; THIN FILMS;

EID: 0034224396     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00359-7     Document Type: Article
Times cited : (7)

References (21)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.