Fabrication of high-frequency electron beam moire grating using multi-deposited layer techniques

Optics and Laser Technology

Volumn 32, Issue 5, 2000, Pages 361-367

  Xie, Huimin ^a   Kishimoto, Satoshi ^b   Shinya, Norio ^b  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; MATHEMATICAL MODELS; MOIRE FRINGES; MULTILAYERS; SCANNING ELECTRON MICROSCOPY; VACUUM APPLICATIONS;

HIGH-FREQUENCY ELECTRON BEAM MOIRE GRATINGS; MULTI-DEPOSITED LAYER METHODS;

DIFFRACTION GRATINGS;

EID: 0034223279     PISSN: 00303992     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0030-3992(00)00081-5     Document Type: Article

References (7)

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