Electron moire method and its application to micro-deformation measurement

Optics and Lasers in Engineering

Volumn 34, Issue 1, 2000, Pages 1-14

  Kishimoto, Satoshi ^a   Huimin, Xie ^a   Shinya, Norio ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CREEP; ELECTRON BEAM LITHOGRAPHY; ELECTRONICS PACKAGING; GRAIN BOUNDARIES; PHOTOLITHOGRAPHY; STRAIN;

ELECTRON MOIRE METHOD; MICRO DEFORMATION MEASUREMENT;

DIFFRACTION GRATINGS;

EID: 0034217362     PISSN: 01438166     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0143-8166(00)00078-6     Document Type: Article

References (7)

1. Theocaris S. Moiré Fringe in Strain Analysis. 1969;Pergamon Press, New York.
2. Post D., Han B., Ifjju P. High Sensitivity Moiré 1994;Springer, New York.
3. Kanson WF, Sutton MA, Peter WH. Holographic and laser speckle interferometry. In: Kabayashi, editor. Handbook on Experimental Mechanics. 2nd ed., New York: VCH publishers, Inc., 1993. [Chapter 8].
4. Kishimoto S., Egashira M., Shinya N. Micro-creep deformation measurement by a moire method using electron beam lithography and electron beam scan. Opt Engng. 32(2):1993;522-526.
5. Read D.T., Dally J.W. Electron beam moiré study of fracture of a glass fiber reinforced plastic composite. Trans ASME. 61:1994;402-409.
6. Chiang FP. Moiré methods of strain analysis. In: Doyle JF, Philip JW, editors. Manual on Experimental Stress Analysis. 5th ed. Bethel, Connecticut, Society for Experimental Mechanics, 1989 [Chapter 7].
7. Cloud G., Raddke R., Peiffer J. Moiré gratings for high temperature and long times. ExpMech. 19(10):1979;19N-21N.