Nanocrystalline SiC films grown Si by HFCVD method and its photoluminescence

Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors

Volumn 21, Issue 7, 2000, Pages 673-676

  Yu, Mingbin ^a   Ma, Jianping ^a   Luo, Jiajun ^a   Chen, Zhiming ^a  

^a XI'AN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; NANOSTRUCTURED MATERIALS; PHOTOLUMINESCENCE; SILICON CARBIDE;

HOT FILAMENT CHEMICAL VAPOR DEPOSITION; NANOCRYSTALLINE CHARACTERISTICS;

THIN FILMS;

EID: 0034216936     PISSN: 02534177     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (6)