X-ray photoelectron spectroscopy characterization of diamond thin film surfaces for electronic device application

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 39, Issue 6 B, 2000, Pages

  Maki, Tetsuro ^a   Ito, Akihiro ^a   Kawamura, Hideki ^a   Kobayashi, Takeshi ^a   Aoki, Masahiko ^a   Kajiyama, Kenji ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BAND STRUCTURE; CHEMICAL BONDS; DEPOSITION; ELECTRIC INSULATING COATINGS; FLUORSPAR; HALOGENATION; NITROGEN; SEMICONDUCTING DIAMONDS; SEMICONDUCTING FILMS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

BAND BENDING; SURFACE STABILIZATION;

DIAMOND FILMS;

EID: 0034207451     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.l575     Document Type: Article

References (12)