Fabrication of semi-continuous profile diffractive optical elements for beam shaping by electron beam lithography

Microelectronic Engineering

Volumn 53, Issue 1, 2000, Pages 325-328

  Nottola, A ^a   Gerardino, A ^a   Gentili, M ^a   Di Fabrizio, E ^b   Cabrini, S ^a   Melpignano, P ^c   Rotaris, G ^c  

^a CNR   (Italy)

^b LABORATORIO TASC   (Italy)

^c Seima Italiana SpA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CALIBRATION; DIFFRACTIVE OPTICS; INTEGRATED CIRCUIT LAYOUT; OPTICAL DEVICES; PHOTORESISTS; POLYMETHYL METHACRYLATES;

BEAM SHAPING; DOSE CALIBRATION; NORMALIZED RESIST THICKNESS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0034206376     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(00)00325-7     Document Type: Article

References (3)

1. 1. M.T. Gale, Direct writing of continuous-relief micro-optics, in: H.P. Herzig ed., Micro-optics, Taylor and Francis, 1997, Chapter 4.
2. 2. M. Gentili, L. Grella, A. Lucchesini, L. Luciani, L. Mastrogiacomo and P. Musumeci, Energy density function determination in very-high-resolution electron-beam lithography, J. Vac. Sci. Technol. B 8 (1990) 1867.
3. 3. E. Di Fabrizio, L. Grella, M. Baciocchi and M. Gentili, Fabrication of diffractive optical elements by electron beam lithography, in: S. Martellucci and A. N. Chester eds., Diffractive Optics and Optical Microsystems, Plenum Publishing Corporation, 1997.