Study of the effect of deuterium on stress-induced leakage current

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 39, Issue 6 B, 2000, Pages

  Mitani, Yuichiro ^a   Satake, Hideki ^a   Ito, Hitoshi ^a   Toriumi, Akira ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DEUTERIUM; DIELECTRIC FILMS; LEAKAGE CURRENTS; OXIDATION; SILICA;

PYROGENIC OXIDATION; STRESS INDUCED LEAKAGE CURRENT;

MOS CAPACITORS;

EID: 0034205895     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.l564     Document Type: Article

References (8)