Development of WO3 thin films using nanoscale silicon particles

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 6 A, 2000, Pages 3572-3578

  Aliev, Ali E ^a   Park, Chul ^b  

^a Heal Physics Department   (Uzbekistan)

^b LG   (South Korea)

Author keywords

Electrochromism; Nanoparticles; Sol gel; Surface morphology; Thin films; Tungsten oxide

Indexed keywords

ELECTROCHROMISM; GLASS; MORPHOLOGY; NANOSTRUCTURED MATERIALS; SEMICONDUCTING INDIUM COMPOUNDS; SILICON; SOL-GELS; SUBSTRATES; SURFACE STRUCTURE; THIN FILMS; TITANIUM DIOXIDE; TUNGSTEN COMPOUNDS;

NANOPARTICLES; TUNGSTEN OXIDE;

OPTICAL FILMS;

EID: 0034205872     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.3572     Document Type: Article

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