Development of a secondary-electron detection system for high-speed high-sensitivity inspection SEM imaging

Microelectronic Engineering

Volumn 53, Issue 1, 2000, Pages 649-652

  Takafuji, A ^a   Nozoe, M ^a   Shinada, H ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC POTENTIAL; ELECTRON OPTICS; ELECTROSTATICS; GROUNDING ELECTRODES; IMAGING SYSTEMS; MAGNETIC FIELDS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICES; SIMULATION;

CONVERTER ELECTRODE; PRIMARY BEAM AXIS; SECONDARY ELECTRON DETECTION SYSTEM; THROUGH THE LENS SYSTEM; WIEN FILTER;

MICROELECTRONIC PROCESSING;

EID: 0034205560     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(00)00397-X     Document Type: Article

References (4)

1. 1. A.D. Brodie, W.D. Meisburger, Microelectronic Engineering 17(1992)399-403
2. 2. Y. Ose, M. Ezumi, H. Todokoro, Proc. Of. SPIE, vol.3677(1999) 930-939.
3. 3. L. Reimer, Image Formation in Low-Voltage Scanning Electron Microscopy, (1993) pp.29-40
4. 4. K. Kuroda, K. Yamamoto, Optik, 86, No.2, (1990) 64-66