Application of scanning probe microscopy for the determination of the structural accuracy of high aspect ratio microstructures

Microelectronic Engineering

Volumn 53, Issue 1, 2000, Pages 637-640

  Achenbach, S ^a   Mohr, J ^a   Pantenburg, F J ^a  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHROMIUM; DIFFRACTION GRATINGS; GOLD; MASKS; POLYMETHYL METHACRYLATES; SILICON WAFERS; SPECTROMETERS; SYNCHROTRON RADIATION;

HIGH ASPECT RATIO MICROSTRUCTURE; MICROSPECTROMETER GRATING; SCANNING PROBE MICROSCOPY;

X RAY LITHOGRAPHY;

EID: 0034205558     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(00)00394-4     Document Type: Article

References (4)

1. 1. E.W. Becker, W. Ehrfeld, et al.: Fabrication of microstructures with high aspect ratios and great structural heights by synchrotron radiation lithography, galvanoforming and plastic moulding (LIGA process). Microelectronic Eng. Vol. 4 (1986)
2. 2. F.J. Pantenburg, S. Achenbach, J. Mohr: Characterisation of defects in very high deepetch X-ray lithography microstructures. Microsystem Technologies. Vol 4, Nr. 2 (1998).
3. 3. P. Krippner, J. Mohr: Hochempfindliche LIGA-Mikrospektrometersysteme für den Intrarotbereich. FZKA 6346. Forschungszentrum Karlsruhe (1999).
4. 4. F.J. Pantenburg, S. Achenbach, J. Mohr: Influence of developer temperature and resist material on the structure quality in deep X-ray lithography. Journal of Vacuum Science & Technology B 16 (6) (1998)