Segregation phenomena in thin films of strongly asymmetric diblock copolymers deposited onto solid substrates

Macromolecules

Volumn 33, Issue 13, 2000, Pages 4877-4885

  Stone, V W ^a,b   Poleunis, C ^a   Bertrand, P ^a   Legras, R ^a   Jonas, A M ^a  

^a UNIVERSITÉ CATHOLIQUE DE LOUVAIN   (Belgium)

^b UCB PHARMA   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DEPOSITION; ELECTRONIC DENSITY OF STATES; INTERFACES (MATERIALS); INTERFACIAL ENERGY; PHASE SEPARATION; POLYBUTADIENES; POLYSTYRENES; SECONDARY ION MASS SPECTROMETRY; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

INTERFACIAL ENERGY REDUCTION; NEUTRON REFLECTOMETRY; X RAY REFLECTIVITY;

BLOCK COPOLYMERS;

EID: 0034205329     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma990364f     Document Type: Article

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