A laser ionization time-of-flight mass spectrometric study of UV laser ablation of polyarylsulfone films

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 6 A, 2000, Pages 3614-3622

  Grivas, Christos ^a,b   Niino, Hiroyuki ^a   Yabe, Akira ^a  

^a NATL INST OF MAT AND CHEM RES   (Japan)

^b INSTITUTE OF COMPUTER SCIENCE   (Greece)

Author keywords

Laser ablation; Material processing; Photothermal decomposition process; Plume dynamics; Polymer; Shifted Maxwell Boltzmann distribution; TOF mass spectrometry

Indexed keywords

LASER ABLATION; MASS SPECTROMETRY; PHOTOIONIZATION; POLYSULFONES; PYROLYSIS; ULTRAVIOLET RADIATION;

MAXWELL-BOLTZMANN DISTRIBUTION; POLYARYLSULFONE;

PLASTIC FILMS;

EID: 0034204708     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.3614     Document Type: Article

References (12)

1. G. Koren and J. T. C Yeh: J. Appl. Phys. 58 (1984) 2036.
2. J. H. Brannon, J. R. Lankard, A. I. Baise, F. Burns and J. Kaufmann: J. Appl. Phys. 58 (1985) 2036.
3. R. Srinivasan and B. Braren: Chem. Rev. 89 (1989) 1303 and references therein.
4. G. Koren: Appl. Phys. B 46 (1988) 147.
5. G. M. Davis, M. C. Gower, C. Fotakis, T. Eftimiopoulos and P. Argyrakis: Appl. Phys. A 36 (1985) 27.
6. R. Srinivasan, B. Braren and R. W. Dreyfus: J. Appl. Phys. 61 (1987) 372.
7. R. Srinivasan, B. Braren, D. E. Seeger and R. W. Dreyfus: Macromolecules 19 (1986) 916.
8. R. Srinivasan, B. Braren, R. W. Dreyfus, L. Hadel and D. E. Seeger: J. Opt. Soc. Am. B 3 (1986) 785.
9. G. B. Blanchet, C. R. Fincher, Jr. C. L.Jackson, S. I Shah and K. H. Gardner: Science 262 (1993) 719.
10. G. B. Blanchet: Macromolecules 28 (1995) 4603.
11. R. C. Estler and N. S. Nogar: Appl. Phys. Lett. 49 (1986) 1175.
12. B. Danielzik, N. Fabricius, M. Roewekamp and D. von der Linde: Appl. Phys. Lett. 48 (1986) 212.