Water adsorption on thin film media

Journal of Colloid and Interface Science

Volumn 225, Issue 1, 2000, Pages 196-203

  Karis, Thomas E ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

Adsorption isotherm; Carbon overcoat; Chemisorption; Lubricant; Magnetic recording; Perfluoropolyether; Potential distortion model; Surface diffusion; Surface energy; Tribology; Zdol

Indexed keywords

HYDROXYL GROUP; LUBRICATING AGENT; WATER;

ADSORPTION; ARTICLE; ENERGY; FILM; HUMIDITY; MAGNETIC FIELD; MODEL; PRIORITY JOURNAL;

EID: 0034192245     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1006/jcis.2000.6745     Document Type: Article

References (33)

1. Ruhe J., Blackman G., Novotny V., Clarke T., Street G. B., Kuan S. J. Appl. Polym. Sci. 53:1994;825.
2. Tyndall G. W., Leezenberg P. B., Waltman R. J., Castenada J. Trib. Lett. 4:1998;103.
3. Waltman R. J., Pocker D. J., Tyndall G. W. Trib. Lett. 4:1998;267.
4. Kasai P. H., Wass A., Yen B. K. J. Info. Storage Proc. Syst. 1:1999;245-258.
5. Forcada M. L., Mate M. J. Colloid Interface Sci. 160:1993;218.
6. Mate C. M., Wilson R. S. Proceedings of the ACS Symposium on Fluorinated Surfaces, Coatings, and Films. August 1998;Boston.
7. Novotny V. J., Baldwinson M. A. J. Appl. Phys. 70:1991;5647.
8. Novotny V. J. IEEE Trans. Magn. 32:1996;1826.
9. Karis T. E., Jhon M. S. Trib. Lett. 5:1998;283.
10. Novotny V. J. J. Chem. Phys. 92:1990;3189.
11. Mate C. M. J. Appl. Phys. 72:1992;3084.
12. Karis T. E., Tyndall G. W. J. Non-Newtonian Fluid Mech. 82:1999;287.
13. Tyndall G. W., Karis T. E., Jhon M. S. Trib. Trans. 42:1999;463.
14. O'Connor T. M., Jhon M. S., Bauer C. L., Min B. G., Yoon D. Y., Karis T. E. Trib. Lett. 1:1995;219.
15. Min B. G., Choi J. W., Brown H. R., Yoon D. Y., O'Connor T. M., Jhon M. S. Trib. Lett. 1:1995;225.
16. Wang R.-H., White R. L., Min B. G., Kellock A., Homola A., Yoon D. IEEE Trans. Magn. 32:1996;3777.
17. Bhushan B., Zhao Z. IEEE Trans. Magn. 33:1997;918.
18. Karis, T. E, Tyndall, G. W, and, Waltman, R. J, in preparation.
19. Li Y., Trauner D., Talke F. E. IEEE Trans. Magn. 26:1990;2487.
20. Li Y., Talke F. E. Trib. Trans. 35:1992;429.
21. Smallen M., Lee J. K., Chao A., Enguero J. IEEE Trans. Magn. 30:1994;4137.
22. Merchant K., Smith S., Yang M. IEEE Trans. Magn. 29:1993;3930.
23. Adamson A. W. J. Colloid Interface Sci. 27:1968;180.
24. Adamson A. W. J. Colloid Interface Sci. 44:1973;273.
25. Tadros M. E., Hu P., Adamson A. W. J. Colloid Interface Sci. 49:1974;184.
26. Danusso F., Levi M., Gianotti G., Turri S. Polymer. 34:1993;3687.
27. Novotny V. J., Karis T. E. Appl. Phys. Lett. 71:1997;52-54.
28. Tyndall G. W., Waltman R. J. Mat. Res. Soc. Symp. Proc. 517:1998;403.
29. Adamson A. W. Physical Chemistry of Surfaces. 1976;Wiley, New York. p. 360.
30. Hirth J. P., Pound G. M. Condensation and Evaporation Nucleation and Growth Kinetics. 1963;Pergamon/Macmillan, New York. p. 6.
31. Ruckenstein E., Rajora P. J. Colloid Interface Sci. 96:1983;488.
32. Villette S., Valignat M. P., Cazabat A. M., Jullien L., Tiberg F. Langmuir. 12:1996;825.
33. Oshanin G., Nechaev S., Cazabat A. M., Moreau M. Phys. Rev. E. 58:1998;6134.