Effect of concentration of complexing agent (tartaric acid) on spray-deposited Bi2S3 films

Materials Research Bulletin

Volumn 35, Issue 7, 2000, Pages 1097-1106

  Gadakh, S R ^a   Bhosale, C H ^a  

^a SHIVAJI UNIVERSITY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

CARBOXYLIC ACIDS; COMPLEXATION; COMPOSITION EFFECTS; DEPOSITION; ELECTRIC CONDUCTIVITY OF SOLIDS; ENERGY GAP; POLYCRYSTALLINE MATERIALS; PYROLYSIS; SEMICONDUCTING BISMUTH COMPOUNDS; SPRAYING; SYNTHESIS (CHEMICAL); THIN FILMS;

BISMUTH DISULFIDE; SPRAY DEPOSITION; SPRAY PYROLYSIS;

SEMICONDUCTING FILMS;

EID: 0034187346     PISSN: 00255408     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0025-5408(00)00312-3     Document Type: Article

References (17)

1. Lokhande C.D., Bhosale C.H. Bull Electrochem. 6:1990;622.
2. Lucose J., Pradeep B. Solid State Commun. 78:1991;535.
3. Krishnamoorthy P.A., Shivkumar G.K. Thin Solid Films. 121:1984;151.
4. Pawar S.H., Bhosale P.N., Uplane M.D., Tamhankar S.P. Thin Solid Films. 110:1983;165.
5. Pawar S.H., Tamhankar S.P., Lokhande C.D. Mater Chem Phys. 11:1984;401.
6. Pramanik P., Bhattacharya R.N. J Electrochem Soc. 127:1980;2087.
7. Desai J.D., Lokhande C.D. Mater Chem Phys. 99:1995;1.
8. Yesugade N.S., Lokhande C.D., Bhosale C.H. Thin Solid Films. 263:1995;145.
9. Biswas S., Mandal A., Mukharjee D., Pramanik P. J Electrochem Soc. 133:1996;48.
10. Bhattachrya R.N., Pramanik P. J Electrochem Soc. 129:1982;32.
11. Desai D., Lokhande C.D. Mater Chem Phys. 41:1995;98.
12. ASTM data card no. 6-0333.
13. ASTM data card no. 57-51.
14. ASTM data card no. 8-247.
15. Gadakh S.R., Killedar V.V., Lokhande C.D., Bhosale C.H. Mater Chem Phys. 56:1998;79.
16. Cottrel A.H. An Introduction to Metallurgy. 1975;173 Arnold, London.
17. Lokhande C.D., Bhosale C.H. Mater Chem Phys. 49:1997;46.